Magnetotransport in NiMnGa thin films
journal contributionposted on 04.05.2005, 00:00 authored by Andriy Vovk, Leszek Malkinski, Vladimir Golub, Charles O’Connor, Zhenjun Wang, Jinke Tang
The influence of substrate temperature and annealing conditions on structure, magnetic, and magnetotransport properties of NiMnGa films was investigated, and the crucial effect of substrate temperature was confirmed. It was found that amorphous disordered films are formed during deposition on a substrate held at room temperature. Postdeposition annealing leads to partial recrystallization and recovery of magnetic properties. Annealing at 773 K does not allow the formation of crystal structure, which is created during deposition on substrates held at the same temperature. The highest values of magnetoresistance were observed in the films with a well-defined crystal structure.